Process schemas unify atomic layer deposition and etching data reporting
Mined from Scientific Literature: Process Schemas for Atomic Layer Deposition and Etching in Materials Science
Artificial Intelligence
Summary
Atomic layer deposition and etching are important methods to build and shape very thin layers of materials, used in technology development. These processes are described in many ways across scientific papers, making comparisons and digital reuse difficult. The authors created standard templates in JSON format that organize information about these processes, including conditions and results. These templates help extract and share process data consistently, making it easier to find and use.
What this means in practice
- •For materials engineers: Use standardized JSON schemas to uniformly record and compare atomic layer process results from literature for design and quality control.
- •For software developers for scientific data: Create tools that automatically extract atomic layer process data from papers into structured records using these validated JSON schemas.
Authors
Sameer Sadruddin, Eleni Poupaki, Alex Watkins, Bora Karasulu, Adriaan J. M. Mackus, Erwin Kessels, Sören Auer, Jennifer D'Souza
Abstract
Atomic layer deposition (ALD) and atomic layer etching (ALE) are reported heterogeneously across experimental and simulation literature in materials science, hindering comparison and machine-actionable reuse. We present four domain-expert-reviewed JSON Schemas for ALD and ALE experimental and simulation processes. Curated with schema-miner and grounded in QUDT using schema-miner pro, the schemas structure materials, process conditions, configurations , and measured or predicted results. We compare their scope, structure, and semantic grounding, and demonstrate their use for schema-guided literature extraction and publication of structured records through ORKG templates.