Papers for
semiconductor manufacturing teams
Papers whose findings have a practical use for this group, as judged from the abstract. Open a paper to read what it means in practice.
Memory restores hidden states for better atom-by-atom crystal evolution
AtomWorld-Mem: Memory-Restored World States for Long-Horizon Atomistic Evolution
Abstract: High-fidelity atomistic evolution over long timescales requires more than observing the current crystal configuration. Instantaneous atomistic snapshots are often incomplete: locally similar configurations can correspond to different hidden dynamical contexts, future event preferences, and waiting-time scales. We argue that this snapshot ambiguity makes long-horizon atomistic evolution fundamentally a memory-based world-state restoration problem. To address this, we introduce AtomWorld-Mem, a memory-restored atomistic world model that recovers the latent world state missing from instantaneous crystal snapshots. AtomWorld-Mem treats the evolving alloy as an AtomWorld: spatial encoders write multi-scale atomistic keyframes from dense local topology and sparse long-range defect context, while short-term event memory and long-term structural memory integrate these keyframes across time to restore a future-predictive evolutionary state. The restored state is used to prioritize legal vacancy-mediated events under single-event Kinetic Monte Carlo (KMC) constraints, while event legality, physical execution, and residence-time updates remain governed by the underlying simulator. Empirically, AtomWorld-Mem improves long-horizon atomistic progress under fixed microscopic event budgets while maintaining high-fidelity evolution across energetic, structural, and vacancy-transport observables. It further transfers zero-shot across diverse unseen alloy-temperature AtomWorlds, suggesting that the learned memory-restoration mechanism captures reusable principles of hidden-state inference rather than a system-specific local energy heuristic. These results position memory-restored world-state modeling as a promising route toward efficient, physically grounded, and transferable atomistic evolution.
Analog circuit yield improves faster with new simulation method
Simulation-Efficient Analog Circuit Yield Optimization via Monte Carlo Zeroth-Order Gradient Estimation
Abstract: Yield optimization under process variation is expensive because each candidate design must be evaluated across many Monte Carlo SPICE samples. The resulting finite-sample yield is also piecewise constant in the design parameters, providing little local information for optimization. We introduce zeroth-order Monte Carlo stochastic gradient descent (ZO-MC-SGD), a black-box method that converts continuous specification margins into stochastic descent directions. Each update evaluates opposite design perturbations under shared process samples, allowing a small simulation batch to estimate a local direction without differentiating SPICE or fitting a global surrogate model. A Spearman rank-correlation test checks that the margin-based loss orders designs consistently with empirical yield. We prove that the estimator is unbiased for a Gaussian-smoothed surrogate and derive variance and sample-complexity bounds with no explicit dependence on process dimension. Across five analog circuit benchmarks with up to 30 design variables and 42 process variables, ZO-MC-SGD reaches a mean yield of 0.95 on four circuits within 50--200 simulations and the empirical yield ceiling on the fifth. Relative to the best of five black-box and learning-based baselines, it reduces the required simulation budget by up to a factor of eight.
Morphology aware model improves wafer defect diagnosis with two options
Morphology-Aware Ambiguity Learning for Wafer Defect Decision Support
Abstract: Wafer map defect recognition is commonly formulated as a fixed-taxonomy classification problem that assigns each wafer to a single defect class. However, some wafers exhibit morphologies near class boundaries, for which forcing a single prediction may be less informative than providing plausible diagnostic alternatives. This paper proposes a morphology-aware ambiguity learning framework that supports three diagnostic actions: automatic single-class diagnosis, assisted diagnosis with two plausible defect classes, and full review. Using the radial, angular, and geometric characteristics of training wafer maps, the framework constructs a class-level ambiguity matrix representing defect-class pairs with similar morphology and plausible diagnostic alternatives. It guides the model to learn plausible alternative classes rather than treating all incorrect classes equally. During inference, the matrix determines whether an uncertain prediction can be represented by a meaningful two-class diagnostic set or should be escalated for full review. Experiments on WM-811K show that the proposed framework outperforms conventional approaches in defect recognition and diagnostic decision support, providing meaningful two-class alternatives while reserving full review for cases with unresolved ambiguity. Illustrative cost analyses further show the potential cost advantage of the proposed routing strategy. The diagnostic behavior of the framework remains consistent across different backbone architectures.